发明名称 METHOD FOR PRODUCING SOLAR CELL
摘要 <p>The occurrence of internal stress is reduced during the solar cell production process, thereby reducing crystal defects and recombination loss. Provided is a method for producing a solar cell having a p-n junction, which involves a step for forming a p-type layer on a semiconductor substrate by applying a coating liquid for diffusion containing impurity which serves as an acceptor, and by diffusing the impurity by means of thermal diffusion and/or a step for forming an n-type layer on a semiconductor substrate by applying a coating liquid for diffusion containing impurity which serves as a donor, and by diffusing the impurity through a thermal diffusion treatment.</p>
申请公布号 EP2495770(A1) 申请公布日期 2012.09.05
申请号 EP20100826597 申请日期 2010.10.21
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 OKANIWA, KAORU
分类号 H01L31/04 主分类号 H01L31/04
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