发明名称 |
METHOD FOR FABRICATING TOUCH SENSOR STRUCTURE |
摘要 |
A method for fabricating a touch sensor structure is disclosed and has steps of forming a conductive layer on a substrate; forming a patterned bridging photo-resist layer on the conductive layer through a half-tone masking process that the bridging photo-resist layer partially covers the conductive layer and has a first portion and a relatively thinner second portion; removing a portion of the conductive layer which is not covered by the bridging photo-resist layer to pattern the conductive layer; and removing the second portion of the bridging photo-resist layer to form a bridging layer and the patterned conductive layer is partially exposed to be a conductive-wire layer. Hence the present invention reduce one masking process during forming conducting wires and bridge structures and provides better production efficiency.
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申请公布号 |
US2012219701(A1) |
申请公布日期 |
2012.08.30 |
申请号 |
US201113212166 |
申请日期 |
2011.08.17 |
申请人 |
WU CHIEN-HAO;HANNSTAR DISPLAY CORPORATION |
发明人 |
WU CHIEN-HAO |
分类号 |
B05D5/12;B05D1/38;B05D3/00;B05D3/02 |
主分类号 |
B05D5/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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