发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
An exposure apparatus is provided that performs well a liquid supply operation for forming a liquid immersion region and a liquid recovery operation to form a liquid immersion region in a desired state, thereby allowing high exposure accuracy and high measurement accuracy. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a liquid (LQ), and includes a liquid supply mechanism (10) that has a supply port (13) capable of supplying the liquid (LQ) substantially in parallel with a surface of the substrate (P). |
申请公布号 |
EP2490248(A2) |
申请公布日期 |
2012.08.22 |
申请号 |
EP20120167830 |
申请日期 |
2005.04.14 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGASAKA, HIROYUKI;KOHNO, HIROTAKA;NISHII, YASUFUMI |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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