| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a suction stage which can hold a work to be sucked in flat state without leading to increase in the work time or loss of product accuracy. <P>SOLUTION: A suction stage (40) that holds a work 22 to be sucked, to which a predetermined mask pattern is exposed by focusing the exposure light, on a flat mounting surface 40b comprises a fixed suction mechanism 60 which can suck the work 22 to be sucked in order to fix the posture thereof for the mounting surface 40b, and a plane suction mechanism 70 which can suck the work 22 to be sucked so as to abut against the mounting surface 40b. The plane suction mechanism 70 has a plurality of plane suction holes 71 opening the mounting surface 40b, and suction operation by each plane suction hole 71 is started sequentially from one arbitrary point on the mounting surface 40b toward the outer edge thereof. <P>COPYRIGHT: (C)2012,JPO&INPIT |
