| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask determination method capable of decreasing costs for manufacturing masks by increasing a non-defective rate of masks. <P>SOLUTION: A mask determination method according to an embodiment includes: a step for measuring at least one of an in-plane error average value within a mask surface and an in-plane variation distribution within the mask surface, with respect to at least one of a size of a mask pattern formed on the mask and optical characteristics; a step for calculating, based on at least one of the in-plane error average value and the in-plane variation distribution, illumination conditions for making a cost function, which shows an image performance that is formed on a substrate when an on-substrate pattern is formed on the substrate by irradiating the mask with exposure light emitted from an illumination light source, closer to a desired value; and a step for determining whether the mask is defective or non-defective based on whether or not the image performance is within a predetermined allowable range when the on-substrate pattern is formed on the substrate by irradiating the mask with the exposure light under the illumination conditions. <P>COPYRIGHT: (C)2012,JPO&INPIT |
