发明名称 SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER AND METHOD OF MANUFACTURING A DEVICE USING LITHOGRAPHIC APPARATUS
摘要 <p>A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.</p>
申请公布号 EP2478416(A2) 申请公布日期 2012.07.25
申请号 EP20100735023 申请日期 2010.07.29
申请人 ASML NETHERLANDS BV 发明人 YAKUNIN, ANDREI;VAN KAMPEN, MAARTEN;TIMOSHKOV, VADIM
分类号 G03F7/20;G02B5/20;G21K1/06 主分类号 G03F7/20
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