发明名称 |
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER AND METHOD OF MANUFACTURING A DEVICE USING LITHOGRAPHIC APPARATUS |
摘要 |
<p>A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.</p> |
申请公布号 |
EP2478416(A2) |
申请公布日期 |
2012.07.25 |
申请号 |
EP20100735023 |
申请日期 |
2010.07.29 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
YAKUNIN, ANDREI;VAN KAMPEN, MAARTEN;TIMOSHKOV, VADIM |
分类号 |
G03F7/20;G02B5/20;G21K1/06 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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