发明名称 |
Method of preparing a patterned film with a developing solvent |
摘要 |
A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent. |
申请公布号 |
US8227181(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US20070377246 |
申请日期 |
2007.08.08 |
申请人 |
MEYNEN HERMAN C. G. D. C.;HARKNESS BRIAN;DOW CORNING CORPORATION |
发明人 |
MEYNEN HERMAN C. G. D. C.;HARKNESS BRIAN |
分类号 |
G03F7/00;G03F7/26;G03F7/32;G03F7/40 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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