POROUS SILICA PRECURSOR COMPOSITION AND METHOD FOR PREPARING THE SAME, POROUS SILICA FILM AND METHOD FOR FORMING THE SAME, SEMICONDUCTOR DEVICE, IMAGE DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE

摘要

A porous silica precursor composition is herein provided and the precursor composition comprises an organic silane represented by the following chemical formula 1: R1m(R2-O)4-mSi (in the formula, R1 and R2 may be the same or different and each represent an alkyl group, and m is an integer ranging from 0 to 3); water; an alcohol; and a quaternary ammonium compound represented by the following chemical formula 2: R3N(R4)3X (in the formula, R3 and R4 may be the same or different and each represent an alkyl group and X represents a halogen atom). The composition is prepared by a method comprising the step of blending the foregoing components. The porous silica precursor composition is coated on a substrate and then fired to thus form a porous silica film. Also disclosed herein include a semiconductor element, an apparatus for displaying an image and a liquid crystal display, each having the foregoing porous silica film.