| 摘要 |
Producing a carbon support with nanoscale silicon particle on its surface comprises contacting a silicon precursor with the carbon support in an inert organic solvent, and decomposing the silicon precursor by adding a reducing agent and/or by heating into pure silicon, which is deposited on the carbon support. An independent claim is included for the carbon support with silicon particles on its surface, where the average particle size of the silicon particles is 1 nm to 20 nm. |
