发明名称 UNIT FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE, AND METHOD FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE
摘要 <P>PROBLEM TO BE SOLVED: To provide a unit comprising a seed material and a feed material enabling to reduce the cost required for liquid phase epitaxial growth of single crystal silicon carbide. <P>SOLUTION: Each of the feed material 11 and the seed material 12 has a surface layer containing polycrystalline silicon carbide whose crystal polymorph is 3C, and when the surface layer is subjected to X-ray diffraction, a diffraction peak corresponding to a (111) crystal plane is observed. Among the (111) crystal planes, the proportion occupied by those having an orientation angle of 67.5&deg; or larger is smaller for the feed material 11 than for the seed material 12. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012136366(A) 申请公布日期 2012.07.19
申请号 JP20100288469 申请日期 2010.12.24
申请人 TOYO TANSO KK 发明人 TORIMI SATOSHI;NOGAMI AKIRA;MATSUMOTO TSUYOSHI
分类号 C30B29/36;C30B19/04 主分类号 C30B29/36
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