发明名称 EXCIMER LIGHT SOURCE
摘要 A light source, with electrodes of alternating polarity attached to a substrate in an excimer ultraviolet (UV) lamp, for generating a plasma discharge between each of the electrodes. The shape of the substrate can shape and control the plasma discharge to reduce exposure of materials susceptible to attack by the halogens. The electrodes can be located such that the plasma discharge occurs in a region where it produces less contact of the halogens with the vulnerable areas of the lamp enclosure. The materials, such as the electrodes, substrate, and envelope, can be selected to withstand corrosive materials. In another embodiment, a plurality of sealed tubes, at least some of which contain an excimer gas are positioned between two electrodes.
申请公布号 WO2012050916(A3) 申请公布日期 2012.07.19
申请号 WO2011US53751 申请日期 2011.09.28
申请人 ULTRAVIOLET SCIENCES, INC.;COOPER, JAMES, RANDALL;CHAFFEE, RONALD, W. 发明人 COOPER, JAMES, RANDALL;CHAFFEE, RONALD, W.
分类号 B01J19/08;G01N23/12 主分类号 B01J19/08
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