| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mold for nanoimprint lithography in which such a problem that a name mark, or the like, touches a transferred substrate or a resin is solved by a simple method without adding a complicated process to manufacture the mold, and to provide a method of manufacturing the same. <P>SOLUTION: In the etching process where a non-transfer region is dug down in order to form a mesa structure having a transfer region as the upper surface, an identification structure configuring a name mark, or the like, is formed simultaneously and an etching mask for forming the identification structure is formed to have a specific size corresponding to the height of the mesa structure having a transfer region as the upper surface. <P>COPYRIGHT: (C)2012,JPO&INPIT |
