发明名称 |
Superfine Pattern Mask, Method for Production Thereof, and Method Employing the Same for forming Superfine Pattern |
摘要 |
There are provided a composition for forming a superfine pattern and a method employing the same for forming a superfine pattern. The composition enables to simply produce a superfine pattern with high mass productivity. The composition comprises perhydropolysilazane (I), silicon-containing polymer (II) having a hydrocarbon group, and a solvent. The mixture of those polymers contains silicon-hydrogen bonds and silicon-hydrocarbon group bonds in such amounts that the number of the silicon-hydrocarbon group bonds is in a ratio of 1 to 44% based on the total number of the silicon-hydrogen bonds and the silicon-hydrocarbon group bonds. The composition is applied on a resist pattern to form a spacer formed of the composition on the side wall of the ridges in the pattern, and then the spacer or a resin layer disposed around the spacer is used as a mask to form a superfine pattern. |
申请公布号 |
US2012160801(A1) |
申请公布日期 |
2012.06.28 |
申请号 |
US20100978740 |
申请日期 |
2010.12.27 |
申请人 |
PADMANABAN MUNIRATHNA;LI JIN;KOIKE TORU;TAKANO YUSUKE;KUROSAWA KAZUNORI |
发明人 |
PADMANABAN MUNIRATHNA;LI JIN;KOIKE TORU;TAKANO YUSUKE;KUROSAWA KAZUNORI |
分类号 |
B05D5/02;C08L83/06 |
主分类号 |
B05D5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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