摘要 |
<p>The component (1) comprises a substrate (2), a covering layer (3), and an intermediate layer (4) formed as a dispersion layer, a diffusion layer and/or as a conversion layer between the substrate and the covering layer. The intermediate layer is applied on the substrate and/or is formed in a part of the substrate by conversion of a material of the substrate. The intermediate layer is formed: by phosphatizing, nitrating, borating, sputtering, carburizing, carbonitriding, Plasma nitro-carburizing and/or anodizing; by chemical nickel dispersion; by thermal method; and by a chemical process. The component (1) comprises a substrate (2), a covering layer (3), and an intermediate layer (4) formed as a dispersion layer, a diffusion layer and/or as a conversion layer between the substrate and the covering layer. The intermediate layer is applied on the substrate and/or is formed in a part of the substrate by conversion of a material of the substrate. The intermediate layer is formed: by phosphatizing, nitrating, borating, sputtering, carburizing, carbonitriding, plasma nitro-carburizing and/or anodizing; by chemical nickel dispersion; by thermal method; by a chemical process, by physical vapor deposition; and/or by chemical vapor deposition. An independent claim is included for a method for manufacturing a component.</p> |