| 摘要 |
<P>PROBLEM TO BE SOLVED: To eliminate development irregularities or the like generated due to temperature fluctuation of a liquid developer supplied to a substrate to be processed. <P>SOLUTION: A resist development apparatus 1 for supplying a liquid developer 11 to a substrate 6 to be processed and executing development processing includes: a storage part 4 for storing the liquid developer controlled to a constant temperature state; a holding part 8 for holding the substrate 6 to be processed; a supply pipe 5 provided with a discharge part 14 for forming a flow path for making the liquid developer stored in the storage part 4 flow and discharging the liquid developer which flows along the flow path, for supplying the liquid developer to the substrate 6 to be processed by discharging the liquid developer from the discharge part 14 toward the substrate 6 to be processed held by the holding part 8; a cut-off member 26 for cutting off the liquid developer so that the liquid developer discharged from the discharge part 14 of the supply pipe 5 does not reach the substrate 6 to be processed; and moving means (27) for moving the cut-off member 26 between a cut-off position for cutting off the liquid developer and a non-cut-off position for not cutting off the liquid developer. <P>COPYRIGHT: (C)2012,JPO&INPIT |
