发明名称 |
METHOD OF FORMING PHOTOMASK USING CALIBRATION PATTERN, AND PHOTOMASK HAVING CALIBRATION PATTERN |
摘要 |
A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation. |
申请公布号 |
US2012159405(A1) |
申请公布日期 |
2012.06.21 |
申请号 |
US201113240732 |
申请日期 |
2011.09.22 |
申请人 |
YOON YOUNG-KEUN;KIM HEE-BOM;LEE MYOUNG-SOO;JEON CHAN-UK;HAN HAK-SEUNG |
发明人 |
YOON YOUNG-KEUN;KIM HEE-BOM;LEE MYOUNG-SOO;JEON CHAN-UK;HAN HAK-SEUNG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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