| 摘要 |
A substrate processing apparatus is provided to easily remove a developing solution from a substrate by using spraying pressure of nitrogen gas which isolates the developing solution from air. A bath(2) has a space in which a substrate subjected to exposure is developed. A transfer member(8) transfers the substrate into the bath. A chemical solution applying member(10) applies a developing solution(W) onto the exposed surface of the substrate moving along a transfer area of the transfer member. A spraying nozzle diffuses nitrogen gas onto the substrate to remove the developing solution, even though the developing solution applied on the substrate is isolated from air. |
