PLASMA CVD DEVICE, MAGNETIC RECORDING MEDIUM AND METHOD FOR MANUFACTURING SAME

摘要

Provided is a plasma CVD device in which discharge at the rear face of an anode can be suppressed. The plasma CVD device of the present invention is characterized by comprising: a chamber; a plasma wall (8) which is arranged within the chamber and has openings at both ends; a holding part which holds a substrate (1) on which a film is to be deposited, the substrate (1) being arranged in the vicinity of an opening at one end of the plasma wall; an anode which is arranged so as to cover the opening at the other end of the plasma wall; a filament-shaped cathode which is arranged inside of the anode and in the vicinity of the opening at the other end of the plasma wall; an AC power source which is electrically connected to one end of the cathode by way of a first wire, and is electrically connected to the other end of the cathode by way of a second wire; and holes which are provided in the anode and have the first and second wires passing therethrough.