发明名称 III-V Compound Semiconductor Material Passivation With Crystalline Interlayer
摘要 The present disclosure reduces and, in some instances, eliminates the density of interface states in III-V compound semiconductor materials by providing a thin crystalline interlayer onto an upper surface of a single crystal III-V compound semiconductor material layer to protect the crystallinity of the single crystal III-V compound semiconductor material layer's surface atoms prior to further processing of the structure.
申请公布号 US2012132913(A1) 申请公布日期 2012.05.31
申请号 US20100955203 申请日期 2010.11.29
申请人 SHIU KUEN-TING;GUO DECHAO;HAN SHU-JEN;KIEWRA EDWARD W.;KOBAYASHI MASAHARU;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 SHIU KUEN-TING;GUO DECHAO;HAN SHU-JEN;KIEWRA EDWARD W.;KOBAYASHI MASAHARU
分类号 H01L29/78;H01L21/20 主分类号 H01L29/78
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