METHOD FOR PRODUCING A RADIATION-RESISTANT QUARTZ GLASS MATERIAL, AND QUARTZ GLASS BODIES PRODUCED ACCORDING TO SAID METHOD

摘要

The invention relates to a method for producing a quartz glass body for optical elements made of synthetic quartz glass for transmitting ultraviolet radiation having a wavelength of 250 nm or shorter, wherein the quartz glass body is produced using a direct deposition method and is run at modified cooling of a holding temperature in the range close to Tg of 1070°C to 1150°C with a cooling rate of 15K/h to 50K/h to a holding temperature T ranging from 750°C to 1070°C, and the holding temperature T is maintained during a holding period which is three times greater than the relaxation period of the quartz glass material as calculated via the shear viscosity.