发明名称 SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD
摘要 PURPOSE: A polymer compound is provided to have excellent solubility of sulfonate, to have high solubility of polymer compound in a resist solvent, and to be able to synthesize 4-fluorophenyl sulfonate by hydrolysis-acyl exchange. CONSTITUTION: A polymer compound comprises repeating units in chemical formula 1a, 2, 3. In chemical formula, R1 is hydrogen, fluorine, or a trifluoromethyl group, R2, R3 and R4 is respectively and independently a substituted or unsubstituted C1-10 linear or branched alkyl group, alkenyl group or oxoalkyl group, or a substituted or unsubstituted C6-18 aryl group, ayloxoalkyl group or 4-fluorophenyl group, two of R2, R3 and R4 is able to form a ring with sulfur in chemical formula 1a., one or more of R2-R4 is a 4-fluorophenyl group, n is an integer from 0-2, R8 is hydrogen, or C1-10 alkyl group, p is or 1, B is C1-10 divalent organic group, which is able to be substituted by a single bond or oxygen, a is an integer form 0-3, b is an integer from 1-3, an X is an acid-labile group.
申请公布号 KR20120054556(A) 申请公布日期 2012.05.30
申请号 KR20110121267 申请日期 2011.11.18
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 OHSAWA YOUICHI;OHASHI MASAKI;TACHIBANA SEIICHIRO;HATAKEYAMA JUN
分类号 C08F20/38;C08F20/10;G03F7/004;G03F7/26 主分类号 C08F20/38
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