SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE

摘要

PURPOSE: A substrate processing apparatus, a manufacturing method of a semiconductor device, and the semiconductor device are provided to prevent degradation of substrate process quality by preventing depositions of reaction products or decomposition materials on the inner wall of a nozzle. CONSTITUTION: A process chamber(201) stores a plurality of substrates(200). A heating unit(207) heats inside the process chamber. A source gas nozzle(233a) supplies a first process gas to the inside the process chamber from a source gas supply unit. A controller controls the heating unit, the source gas supply unit, and an exhaust unit. A treatment furnace(202) comprises a process tube(205) and a manifold(209).