发明名称 |
ALIGNMENT METHOD, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment method capable of highly precisely positioning a substrate placed on a stage. <P>SOLUTION: This alignment method for positioning a substrate placed on a table includes steps for: detecting a substrate mark formed on the surface of the substrate along a first direction; acquiring position information of the substrate mark along the surface of the substrate related to a second direction that is orthogonal to the first direction, based on the detection result of the substrate mark; calculating an offset amount of the position of the substrate based on a reference position information of the substrate mark and the position information related to the second direction; and moving the table on which the substrate is placed, based on the offset amount of the position of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012093585(A) |
申请公布日期 |
2012.05.17 |
申请号 |
JP20100241369 |
申请日期 |
2010.10.27 |
申请人 |
NIKON CORP |
发明人 |
MASUDA MITSUTOSHI;MORIOKA TOSHINOBU;SHINOZAKI TADAAKI;AOKI ATSUYUKI |
分类号 |
G03F9/02;G03F7/20;H01L21/027 |
主分类号 |
G03F9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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