发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND DESIGN PROGRAM OF SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To handle the desired number of transistors in a semiconductor device. <P>SOLUTION: A semiconductor device comprises: a first to fourth diffusion layers of a first conductive type formed in a semiconductor substrate; fifth to eighth diffusion layers of a second conductive type formed in the semiconductor substrate; first electrodes formed above between the first and second diffusion layers and between the fifth and sixth diffusion layers; second electrodes formed above between the third and fourth diffusion layers and between the seventh and eighth diffusion layers; and an insulating film and a third electrode formed above between the sixth and seventh diffusion layers. The third electrode is connected to a first potential. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012094887(A) |
申请公布日期 |
2012.05.17 |
申请号 |
JP20110277523 |
申请日期 |
2011.12.19 |
申请人 |
RENESAS ELECTRONICS CORP |
发明人 |
SUZUKI BUNRO |
分类号 |
H01L27/092;H01L21/76;H01L21/82;H01L21/822;H01L21/8238;H01L27/04 |
主分类号 |
H01L27/092 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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