发明名称 |
METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL |
摘要 |
The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
|
申请公布号 |
US2012121857(A1) |
申请公布日期 |
2012.05.17 |
申请号 |
US201113295652 |
申请日期 |
2011.11.14 |
申请人 |
KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI;ASAHI GLASS COMPANY, LIMITED |
发明人 |
KOIKE AKIO;MITSUMORI TAKAHIRO;IWAHASHI YASUTOMI;OGAWA TOMONORI |
分类号 |
C03C3/04;B32B3/00;C03B25/00;G03F1/24 |
主分类号 |
C03C3/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|