SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS WITH IT

摘要

PURPOSE: A support unit and a substrate processing apparatus including the same are provided to prevent particle from being generated from a heat transfer sheet by arranging a metal sheet an upper portion of the heat transfer sheet. CONSTITUTION: A chamber unit(100) forms a space for bonding an upper plate(S2) and a lower plate(S1). A lower support unit(200) includes a susceptor(200a) and a sub heater(200b) supporting the lower plate. A top support unit(300) comprises a ceramic plate(300a) and a top heater(300b) supporting the upper plate. A lower power supply unit(620) supplies a heating source to the lower support unit. A top power supply unit(820) supplies a heating source to the top support unit.