DIGITAL LITHOGRAPHY APPARATUS AND METHOD THEREOF

摘要

PURPOSE: A digital lithography apparatus and a method thereof for improving patterning accuracy are provided to obtain excellent line width roughness including a curved component or a circular component by arranging an image address structure to a delta type. CONSTITUTION: A controller(30) controls an on/off operation of a digital micromirror device. A projection optical part(40) is arranged between an optical modulator and a substrate. The projection optical part reflects light reflected from the digital micromirror device onto the substrate. A substrate transfer part(50) transfers the substrate to an opposite direction to a scan direction. A moving pitch determination unit(70) determines a moving pitch.