发明名称 |
SUBLIMATE SOURCE OF EVAPORATED MATERIAL FOR MOLECULAR BEAM EPITAXY INSTALLATION |
摘要 |
FIELD: electricity. ^ SUBSTANCE: sublimate source of evaporated material for molecular beam epitaxy installation includes evaporated material carrier fixed on current leads where end of each current lead contains plate in which hole is made and carrier is made as bar with tapered ends and installed with its tapered ends in the holes made in plates. ^ EFFECT: simplification of manufacturing and lowering material consumption for manufacturing evaporated element with increase in its dimensions and providing high purity and high density of crated flow of evaporated material, as well as prevention of destruction and providing simplicity of evaporated element replacement. ^ 2 cl, 2 dwg |
申请公布号 |
RU2449411(C1) |
申请公布日期 |
2012.04.27 |
申请号 |
RU20110101328 |
申请日期 |
2011.01.13 |
申请人 |
FEDERAL'NOE GOSUDARSTVENNOE BJUDZHETNOE OBRAZOVATEL'NOE UCHREZHDENIE VYSSHEGO PROFESSIONAL'NOGO OBRAZOVANIJA "NIZHEGORODSKIJ GOSUDARSTVENNYJ UNIVERSITET IM. N.I. LOBACHEVSKOGO" |
发明人 |
SHENGUROV VLADIMIR GENNAD'EVICH;SVETLOV SERGEJ PETROVICH;CHALKOV VADIM JUR'EVICH;DENISOV SERGEJ ALEKSANDROVICH;SHENGUROV DMITRIJ VLADIMIROVICH |
分类号 |
H01L21/205 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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