发明名称 METHOD OF POLISHING AND MANUFACTURING GLASS SUBSTRATE, AND POLISHING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing device that prevents glass substrates from being finished in various sizes. <P>SOLUTION: The polishing device includes an upper surface plate 40 as a polishing means for polishing the glass substrate in accordance with the same target thickness value A every time. The polishing device is provided with: a contact displacement sensor 65 measuring a relative position of the upper surface plate 40 relative to a motor driving shaft 61 for measuring a thickness value Tc during polishing the glass substrate polished by the upper surface plate 40 in the current polishing process; and a control part 90 calculating a thickness correction value Tp of the thickness value Tc during polishing derived based on a measurement result by the contact displacement sensor 65 in accordance with a finished dimension error between a finished thickness value T of the glass substrate polished by the upper surface plate 40 in the former polishing process and the target thickness value A. The glass substrate is polished by the upper surface plate 40 until the thickness correction value Tp reaches the target thickness value A. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012081553(A) 申请公布日期 2012.04.26
申请号 JP20100229712 申请日期 2010.10.12
申请人 ASAHI GLASS CO LTD 发明人 IKEDA KUNINOBU;DEGUCHI MASAHIRO;YAMAGUCHI RYU;KOBASHI TAKANORI;ITO MASABUMI;WAKABAYASHI JUNJI
分类号 B24B37/04;B24B1/00;B24B7/24;B24B37/013;B24B49/04;B24B49/10;B24B49/14;G11B5/84 主分类号 B24B37/04
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