METHOD OF SLIMMING RADIATION-SENSITIVE MATERIAL LINES IN LITHOGRAPHIC APPLICATIONS

摘要

A method and system for patterning a substrate using a radiation-sensitive material is described. The method (500) and system include forming a layer of radiation-sensitive material on a substrate (510), exposing the layer of radiation- sensitive material to a pattern of radiation (520), and then performing a post-exposure bake following the exposing (530). The imaged layer of radiation-sensitive material is then positive-tone developed to remove a region having high radiation exposure to form radiation-sensitive material lines (540). An exposure gradient within the radiation-sensitive material lines is then removed (550), followed by slimming the radiation-sensitive material lines (560).