COMPOSITION FOR REMOVING A PHOTORESIST

摘要

PURPOSE: A composition for photoresist stripping liquid is provided to reduce the change of the composition in the process of heating and to improve the stripping performance of photoresist by including chain type amine, a solvent, and a stripping accelerator. CONSTITUTION: A composition for photoresist stripping liquid includes chain type amine, a solvent, and a stripping accelerator. The composition further includes an anti-corrosion agent. The chain amine is one or more selected from a group including monoethanolamine, ethylenediamine, 2-(2-aminoetoxy)ethanol, 2-(2-aminoethylamino)ethanol, 1-amino-2-propanol, diethanolamine, iminobispropylamine, 2-methylaminoethanol, N-methylethanolamine, and triethylamino ethane. The solvent is a protic polar solvent, a non-protic polar solvent, and the mixture of the same. The anti-corrosion agent is selected from a group including triazole-based compounds, mercapto-based compounds, alkyl gallate-based compounds, and the mixture of the same.