| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film which has a fine rugged structure with a depth of ≥50 nm on the surface, and further has excellent solvent resistance. <P>SOLUTION: The film having a fine rugged structure on the surface is obtained by producing a precursor film using a sol solution preparing by mixing: (A) a trifunctional silane compound containing a photoresponsive part inducing deformation by the action of light in 1 to 25 mol%; (B) a trifunctional silane compound having an aromatic ring and not containing the photoresponsive part in 70 to 98 mol%; and (C) a tetrafunctional silane compound in 1 to 25 mol%, forming a fine rugged structure on the surface of the precursor film, and subjecting the precursor film having the fine rugged structure to heating treatment. The depth of the fine rugged structure of the film after the heating treatment is ≥50 nm, and, when the film after the heating treatment is immersed into acetone at a room temperature for 5 min, the persistence of the absorbance of the film after the immersion to the absorbance of the precursor film before the heating treatment in a wavelength of 480 nm is ≥90%. <P>COPYRIGHT: (C)2012,JPO&INPIT |
