| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that suppresses the change in imaging performance even in a large projection optical system. <P>SOLUTION: An exposure apparatus 1 is provided with air supply means 12 that supplies air to the inside of a lens-barrel 11 that accommodates a projection optical system 5, and temperature control means 13 that adjusts the internal temperature of the lens-barrel 11 by controlling the air supply means 12. The temperature control means 13 controls the air supply means 12 to raise the supply air temperature in accordance with the rise of the internal temperature associated with exposure processing. <P>COPYRIGHT: (C)2012,JPO&INPIT |
