| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus capable of continuously supplying a thin film material and performing continuous vapor deposition for a long period of time. <P>SOLUTION: A vacuum vapor deposition apparatus 1 includes: a vacuum chamber 2 where a glass substrate 8 can be disposed; and an evaporator 3 including a heat generation part 20 for evaporating a thin film material 19, while the glass substrate 8 is disposed in an inside of the vacuum chamber 2 and the thin film material 19 evaporated by the evaporator 3 is vaporized to deposit a film having a predetermined constituent on the glass substrate 8. In the vacuum vapor deposition apparatus, the heat generation part 20 is located within the vacuum chamber 2 or at a position communicating with the vacuum chamber 2, while being arranged under a vacuum environment when a thin film is deposited, and a thin film material feeder 14 feeding the thin film material 19 to the heat generation part 20 from an outside of the vacuum chamber 2 is provided. <P>COPYRIGHT: (C)2012,JPO&INPIT |
