| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming method for a photosensitive substance using simple and inexpensive devices and equipment, the photosensitive substance having a uniform film thickness with a steep cross section side wall and being usable as a female mold for plating, a microchannel and a container. <P>SOLUTION: A pattern forming method for a photosensitive substance is performed as follows. First, the photosensitive substance is applied onto a substrate thickly with a uniform thickness. Then, on the photosensitive substance, a light-shielding pattern to become a base is formed using a light shielding liquid by means of a dispenser, an ink-jet printer or screen printing. Thereafter, the photosensitive substance is exposed to light using the light-shielding pattern as a masking material. <P>COPYRIGHT: (C)2012,JPO&INPIT |
