| 摘要 |
According to an embodiment, an imprint apparatus includes a template holder, a space adjusting unit, a relative position control unit and a curing unit. The template holder holds a plurality of templates in an arrayed form, each of the templates has a shape of a pattern to be transferred to a substrate to be processed. The space adjusting unit adjusts a space between the templates to a desired value. The relative position control unit controls relative positions of the templates and the substrate to be processed to bring the templates into contact with a resist on the substrate to be processed. The curing unit cures the resist while the templates are in contact with the resist. |
