发明名称 DEFECT INSPECTION METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology with which a distance and a touch between a probe distal end and a sample can be accurately detected through a simple approach. <P>SOLUTION: A defect inspection apparatus has an electronic optical system which irradiates a sample with electron beams, at least one probe which probes the sample, and a plurality of detectors for detecting secondary electrons or reflection electrons from the sample. The defect inspection apparatus is used to measure electric characteristics of an inspection target formed on the sample. The probe is first brought closer to the inspection target on the sample. Signals from the plurality of detectors are then inputted to produce an image of the inspection target in such a manner as to include an image of a distal end of the probe. The image of the inspection target is produced on the basis of a signal from the detector selected by a user from among the plurality of detectors. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012032179(A) 申请公布日期 2012.02.16
申请号 JP20100169658 申请日期 2010.07.28
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SASAJIMA MASAHIRO;SUZUKI HIROYUKI;ANDO TORU
分类号 G01R31/302 主分类号 G01R31/302
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