发明名称 ARTICLE AND METHOD FOR BONDING SUBSTRATES WITH LARGE TOPOGRAPHIES
摘要 The present invention is an article useful in the field of wafer processing, for example. The article includes a substrate, a leveling layer, a joining layer, a photothermal conversion layer and a temporary carrier. The substrate has a first major surface, a second major surface and at least one three dimensional topographical feature extending from the first major surface and having an initial step height. The leveling layer is positioned adjacent to the first major surface and reduces a topography of the substrate to between about 5% and about 95% of the initial step height. The joining layer is positioned adjacent to the leveling layer and further reduces the topography of the substrate to less than about 20% of the initial step height. The photothermal conversion layer is positioned adjacent to the joining layer and the temporary carrier is positioned adjacent the photothermal conversion layer.
申请公布号 US2012034426(A1) 申请公布日期 2012.02.09
申请号 US20100850772 申请日期 2010.08.05
申请人 WEBB RICHARD J.;MAHONEY WAYNE S.;LARSON ERIC G.;3M INNOVATIVE PROPERTIES COMPANY 发明人 WEBB RICHARD J.;MAHONEY WAYNE S.;LARSON ERIC G.
分类号 B32B3/30;B32B37/02;B32B38/00 主分类号 B32B3/30
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