manufacturing method of high resistive metal thin film using intermittent sputtering

摘要

PURPOSE: A manufacturing method for a high-resistance metal thin film using intermittent sputtering is provided to cost-efficiently manufacture a metal thin film having a desired thickness. CONSTITUTION: A manufacturing method for a high-resistance metal thin film using intermittent sputtering is as follows. A substrate is pre-sputtered(S200). Metal thin films are deposited on the substrate through sputtering(S300). The sputtering deposition is stopped and delayed(S400). A thin film having a specific thickness is formed by repeating the processes(S500).