发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can inhibit a difference or variation in a gap between a column part of a boat and an edge of a heat insulation plate thereby improving film thickness uniformity and productivity. <P>SOLUTION: The substrate processing apparatus comprises a substrate container for containing a plurality of substrates, a heat insulation plate storage part for storing a plurality of heat insulation plates, a boat on which the plurality of substrates and the plurality of heat insulation plates are placed, a processing chamber for containing the boat on which the plurality of substrates and the plurality of heat insulation plates are placed and processing the plurality of substrates on the boat, and a substrate transfer device for transferring the substrate between the substrate container and the boat and transferring the heat insulation plate between the heat insulation plate storage part and the boat. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012023198(A) 申请公布日期 2012.02.02
申请号 JP20100159809 申请日期 2010.07.14
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 NISHIDA KEIGO
分类号 H01L21/677;H01L21/683 主分类号 H01L21/677
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