发明名称 |
PLASMA PROCESSING APPARATUS AND LINER ASSEMBLY FOR TUNING ELECTRICAL SKEWS |
摘要 |
<p>The invention discloses a plasma processing apparatus comprising a chamber lid, a chamber body and a support assembly. The chamber body, defining a processing volume for containing a plasma, for supporting the chamber lid. The chamber body is comprised of a chamber sidewall, a bottom wall and a liner assembly. The chamber sidewall and the bottom wall define a processing volume for containing a plasma. The liner assembly, disposed inside the processing volume, comprises of two or more slots formed thereon for providing an axial symmetric RF current path. The support assembly supports a substrate for processing within the chamber body. With the liner assembly with several symmetric slots, the present invention can prevent electromagnetic fields thereof from being azimuthal asymmetry.</p> |
申请公布号 |
WO2012012200(A1) |
申请公布日期 |
2012.01.26 |
申请号 |
WO2011US43083 |
申请日期 |
2011.07.06 |
申请人 |
APPLIED MATERIALS, INC.;CARDUCCI, JAMES D.;CHEN, ZHIGANG;RAUF, SHAHID;COLLINS, KENNETH S. |
发明人 |
CARDUCCI, JAMES D.;CHEN, ZHIGANG;RAUF, SHAHID;COLLINS, KENNETH S. |
分类号 |
H05H1/24;H05H1/34;H05H1/46 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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