发明名称 Method of fabricating a semiconductor device with a back electrode
摘要 A semiconductor device capable of stabilizing operations thereof is provided. This semiconductor device comprises a substrate provided with a region having concentrated dislocations at least on part of the back surface thereof, a semiconductor element layer formed on the front surface of the substrate, an insulator film formed on the region of the back surface of the substrate having concentrated dislocations and a back electrode formed to be in contact with a region of the back surface of the substrate other than the region having concentrated dislocations.
申请公布号 US8101465(B2) 申请公布日期 2012.01.24
申请号 US20070723449 申请日期 2007.03.20
申请人 HATA MASAYUKI;TODA TADAO;OKAMOTO SHIGEYUKI;INOUE DAIJIRO;SANYO ELECTRIC CO., LTD. 发明人 HATA MASAYUKI;TODA TADAO;OKAMOTO SHIGEYUKI;INOUE DAIJIRO
分类号 H01L21/00;H01L21/20;H01L33/00 主分类号 H01L21/00
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