发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE MANUFACTURED BY USING THE SAME, METHOD FOR MANUFACTURING ELECTRIC AND ELECTRONIC COMPONENT, AND ELECTRIC AND ELECTRONIC COMPONENT MANUFACTURED BY USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device which has superior productivity without a flax washing process, and can reduce warpage caused by grinding a back surface of a semiconductor wafer, and the semiconductor device manufactured by using the same. <P>SOLUTION: A method for manufacturing a semiconductor device comprises a first step for forming a resin composition layer with a flux function and a back grind tape on a circuit surface of a semiconductor wafer where a first connecting electrode is provided thereon, in this order; a second step for grinding an opposing surface to the circuit surface of the semiconductor wafer; a third step for laminating a dicing tape on the opposing surface to the circuit surface of the semiconductor wafer; a forth step for peeling off the back grind tape; a fifth step for dividing the resin composition layer with the flux function and the semiconductor wafer into pieces to obtain a semiconductor chip having the resin composition layer with the flux function; and additional two steps. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012015444(A) |
申请公布日期 |
2012.01.19 |
申请号 |
JP20100152933 |
申请日期 |
2010.07.05 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
MAEJIMA KENZO |
分类号 |
H01L21/60;H01L21/301;H01L21/304;H01L23/29;H01L23/31 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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