| 摘要 |
PURPOSE: A composition for residues from a photo-sensitive anti-etching film is provided to simultaneously eliminate insoluble residues generated from etching and ashing processes and wash aluminum, copper wires, and tungsten plugs. CONSTITUTION: A composition for residues from a photo-sensitive anti-etching film includes 1-70 weight% of glycolic acid and remaining amount of water. The pH value of the composition is adjusted to be in a range between 4 and 10 by applying a pH adjusting agent. 5-50 parts by weight of the pH adjusting agent is included in 100 parts by weight of the mixture of the glycolic acid and water. The pH adjusting agent is one or the mixture of primary alkyl amine, secondary alkyl amine, tertiary alkyl amine, or alkanol amine. |
