POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A positive resist composition and a method for forming a resist pattern are provided to form the resist pattern of superior shapes by reducing roughness. CONSTITUTION: A positive resist composition includes a resin component, a compound, and an acid generating component. The compound is represented by chemical formula 1. The acid generating component generates acid based on exposure. The resin component includes structure units. One structure unit includes an acid dissociation dissolving inhibitor and is derived from acrylic acid ester. An atom excluding a hydrogen atom or a substituting group is capable of being bonded to a carbon atom at the α-position of the acrylic acid ester. Another structural unit includes -SO_2-containing cyclic group and is derived from the acrylic acid ester.