发明名称 |
BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<p>An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.</p> |
申请公布号 |
KR20120003870(A) |
申请公布日期 |
2012.01.11 |
申请号 |
KR20117022825 |
申请日期 |
2010.03.26 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA;KAWAGUCHI KOUJI |
分类号 |
G03F7/004;C08K5/04;C09K3/00;G03F7/038 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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