发明名称 |
CLEANING LIQUID COMPOSITION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning liquid composition excellent in cleaning effect on a contaminant existing on an alignment layer substrate because the cleaning liquid composition is excellent in moistness and permeation effect. <P>SOLUTION: The cleaning liquid composition does not contain an alkaline compound but contains, based on the total weight of the composition: 0.1-15 wt.% of 1-5C lower alcohol; 0.1-15 wt.% of a water-soluble glycol ether compound; 0.01-10 wt.% of organophosphorus acid; 0.001-10 wt.% of an azole compound; and a balance comprising water. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012001719(A) |
申请公布日期 |
2012.01.05 |
申请号 |
JP20110129478 |
申请日期 |
2011.06.09 |
申请人 |
DONGWOO FINE-CHEM CO LTD |
发明人 |
YOON HYO JOONG;KIM SUNG SIK;BANG SOON HONG;KIM BYOUNG MOOK |
分类号 |
C11D7/36;B08B3/02;B08B3/04;C11D3/20;C11D3/28;C11D3/36;C11D7/26;C11D7/32;C11D17/08;G02F1/13;G02F1/1337 |
主分类号 |
C11D7/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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