| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning method, a cleaning apparatus, an exposure method, an exposure apparatus, and a device manufacturing method which are capable of cleaning a reflection surface of an optical member. <P>SOLUTION: The exposure device 100 includes a cleaning light source CS which is provided on at least one of the optical members included in an illumination optical system 2 and an projection optical system PL and emits cleaning light CL to the reflection surface of the optical member from a plurality of directions. The cleaning light source CS is composed of an annular member having an opening 31 in front of the reflection surface of a condenser mirror 19a. <P>COPYRIGHT: (C)2012,JPO&INPIT |
