SILICON CARBIDE SUBSTRATE AND METHOD FOR PRODUCTION THEREOF

摘要

A SiC substrate includes a first orientation flat (12) parallel to the <11-20> direction, and a second orientation flat (13) being in a direction intersecting the first orientation flat (12) and being different from the first orientation flat (12) in length. An alternative SiC substrate has a rectangular plane shape, and a main surface of the substrate includes a first side parallel to the <11-20> direction, a second side in a direction perpendicular to the first side, and a third side connecting the first side to the second side. A length of the third side projected in a direction in which the first side extends is different from a length of the third side projected in a direction in which the second side extends.