| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition which can provide a pattern having improved uniformity of coating film thickness and excellent size uniformity in the wafer surface on which the pattern has been formed by liquid immersion exposure, and a pattern forming method using the composition. <P>SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains: (A) a resin which has a repeating unit represented by the following general formula (A1) and increases its dissolution rate in an alkali developer by an action of an acid; (B) a compound which generates an acid by irradiation with actinic rays or radiation; and (C) a resin which comprises a repeating unit having a lactone structure substituted by a group having a fluorine atom. (In the formula, R<SB POS="POST">1</SB>represents a hydrogen atom, an alkyl group, a fluoroalkyl group, a halogen atom or CH<SB POS="POST">2</SB>OH; R<SB POS="POST">2</SB>represents an alkylene group, a cycloalkylene group or a bivalent connecting group that is formed by combining them; n represents an integer of 0-5; if n is 2 or more, a plurality of R<SB POS="POST">2</SB>may be the same or different.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
